Ruyell Ho and Li Lin Lee: Language of Abstraction
@ Ruth and Samuel Moy Gallery, Chinese American Museum of Chicago
238 W 23rd St, Chicago, IL 60616
Opening Saturday, September 20th, from 2PM - 5PM
On view through Sunday, April 26th
The Chinese American Museum of Chicago (CAMOC) is excited to present Ruyell Ho and Li Lin Lee: Language of Abstraction featuring select work by two artists of Chinese descent born in Asia, now living in Chicago, whose studio practice since the Seventies explore abstraction that re-envisions language visually.
In a city known for its own brand of Surrealist and Pop Art-influenced figurative painting, Ho and Lee forged separate but parallel paths, doggedly creating their own lexicon centered on the form, structure, and mechanics that originates from the “body” of the written as arguably ideogrammic and calligraphic over the past fifty years.
Curated by Larry Lee, this exhibition acknowledges and celebrates their long artistic careers as part of their contribution to the Chicago art world and Chinese American diasporic experience.
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Tags: Chinese-American Museum of Chicago, Language of Abstraction, Li Lin Lee, Ruth and Samuel Moy Gallery, Ruyell Ho
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